About R&D Center

About R&D Center

UP CHEMICAL started the semiconductor material business by developing and mass-producing the world's first ALD precursor for DRAM high-k thin film formation.

Since then, we have continued to develop next-generation ALD/CVD precursors that can be used as DRAM, flash memory, dielectric films of logic semiconductors, electrodes, and wiring metals. The developed precursors have been evaluated with various domestic and foreign semiconductor device companies and equipment companies, and some are already being used for mass production of semiconductor devices.

Researchers at UP CHEMICAL design and synthesize compounds necessary for semiconductor production and apply them to customer use conditions such as ALD/CVD to evaluate film properties, electrical properties of the formed films, and develop manufacturing processes to mass-produce and supply compounds with excellent properties.

UP CHEMICAL will continue its research and development to supply the electronic materials necessary for the production of semiconductors, display devices necessary for the society of the future.

R&D Area

  • 01

    Material for Semiconductor

    ALD/CVD Material Development

     
  • 02

    Material Mass Production Technology

    Optimization of manufacturing process and development of mass production technology

     
  • 03

    Thin Film Processing Technology

    Development of process technology and material evaluation using thin-film devices

     
  • 04

    Process Chemicals

    Development of chemical materials to improve process yield

     

R&D Achievements

Status of Patents Held (Registered) * As of August 2024

Domestic

Applied 0 cases

Registered 0 cases

Abroad

Applied 0 cases

Registered 0 cases

2024

  • 5 patents pending in Korea

2023

  • Patent Registration No.: 10-2574475 Compositions for film deposition comprising Group 4 metal element-containing precursor compounds, and methods of film formation using the same

2022

  • Patent Registration No.: 10-2489662 Ruthenium precursor compositions, methods for their preparation, and methods of forming ruthenium-containing films using the same
  • Patent Registration No.: 10-2537665 Methods of forming silicone-containing films and silicone-containing films formed thereby

2021

  • Patent Registration No.: 10-2623692 Hafnium precursor compounds, including compositions for forming hafnium-containing films, and methods for forming hafnium-containing films
  • Patent Registration No.: 10-2513301 Precursor composition for silicone-containing film formation and method of forming silicone-containing film using same
  • Patent Registration No.: 10-2491073 Precursor composition for silicone-containing film formation and method of forming silicone-containing film using same
  • Patent Registration No.: 10-2653042 Molybdenum zero-valent precursor compounds, methods for their preparation, and methods for deposition of molybdenum-containing thin films using the same

2020

  • Patent Registration No.: 10-2595199 Niobium precursor compounds, precursor compositions for film formation including the same, and methods of forming niobium-containing films

2019

  • Patent Registration No.: 10-2308644 Silicone precursor compound and method OF preparation, deposition method OF silicon-containing oxidizing thin film OR nitriding thin film using same
  • Patent Registration No.: 10-2446629 Yttrium/Lanthanide Metal Precursor Compounds, Methods of Making Them, Compositions for Forming Membranes Including Them, and Methods of Deposition of Yttrium/Lanthanide Metal-Containing Membranes Using Them

2018

  • Patent Registration No.: 10-2471126 Group 4 metal elements-containing compounds, methods of their preparation, precursor compositions for deposition of membranes including the same, and methods of deposition of membranes using the same
  • Patent Registration No.: 10-2509744 Aluminum compounds and methods OF forming aluminum-containing films using the same

R&D Network

UP CHEMICAL's R&D Center collaborates with various companies, research institutes, universities, and others to conduct collaborative research,
which will play an important role in maximizing the efficiency of research and development and accelerating innovation by leveraging their expertise
and sharing information resources such as research results, technologies, and market trends.

R&D NetworkR&D Network
Domestic semiconductor device companies

Domestic semiconductor device companies

Supply of ALD Precursor

Overseas semiconductor device company

Overseas semiconductor device company

ALD process development

Overseas semiconductor equipment supplier

Overseas semiconductor equipment supplier

Supply of ALD Precursor

Sponsored by ALD Societies at home and abroad

Sponsored by ALD Societies at home and abroad

University Industry Collaboration

University Industry Collaboration

Precursor evaluation and ALD process development

Domestic display companies

Domestic display companies

Supply of ALD Precursor

Domestic semiconductor equipment supplier

Semiconductor device and equipment manufacturer

Supply of process chemicals

Domestic semiconductor equipment supplier

Domestic semiconductor equipment supplier

Supply of ALD Precursor

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